Improvement of thermal stability of Ni-Germanide with Ni/Co/Ni/TiN structure for high performance ge metal-oxide-semiconductor field effect transistors

Hong Sik Shin, Se Kyung Oh, Min Ho Kang, Hyuk Min Kwon, Jungwoo Oh, Prashant Majhi, Raj Jammy, Ga Won Lee, Hi Deok Lee

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