Improvement of work function and hole injection efficiency of graphene anode using CHF3 plasma treatment

Himchan Cho, Seong Dae Kim, Tae Hee Han, Intek Song, Jin Woo Byun, Young Hoon Kim, Sungjoo Kwon, Sang Hoon Bae, Hee Cheul Choi, Jong Hyun Ahn, Tae Woo Lee

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11 Citations (Scopus)


Wereport improvement of hole injection efficiency of a graphene anode by tuning its work function (WF) via surface fluorination.Weused chemical vapor deposition to synthesize high-quality graphene sheets and then treated them withCHF3 plasma to induce fluorination.Weused x-ray photoelectron spectroscopy to examine the fluorine coverage and the kind of chemical bonds in fluorinated graphene (FG). Also, we used ultraviolet photoelectron spectroscopy to systematically study the changes in theWFand sheet resistance of the FG sheets with varying plasma exposure time (0, 10, 30, 60, 90 s) to find an optimum fluorination condition for hole injection. TheWFof graphene sheets was increased by up to 0.74 eV, as a result of the formation of carbon-fluorine bonds that function as negative surface dipoles.Wefabricated hole-only devices and conducted dark injection space-chargelimited- current transient measurement; the fluorination greatly increased the hole injection efficiency of graphene anodes (from 0.237 to 0.652). The enhanced hole injection efficiency of FG anodes in our study provides wide opportunities for applications in graphene-based flexible/stretchable organic optoelectronics.

Original languageEnglish
Article numberA7
Journal2D Materials
Issue number1
Publication statusPublished - 2015 Dec 31

Bibliographical note

Publisher Copyright:
©2015 IOP Publishing Ltd.

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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