In-situ annealing study on the thermal stability of nickel germanides

Jae Wook Lee, Kyung Hwan Kwak, Hyoungsub Kim, Cheol Woong Yang, Dongwon Lee, Dae Hong Ko

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni0.9Ta0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni0.9Ta0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni0.9Ta0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.

Original languageEnglish
Pages (from-to)677-680
Number of pages4
JournalJournal of the Korean Physical Society
Volume50
Issue number3
Publication statusPublished - 2007 Mar 1

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Lee, J. W., Kwak, K. H., Kim, H., Yang, C. W., Lee, D., & Ko, D. H. (2007). In-situ annealing study on the thermal stability of nickel germanides. Journal of the Korean Physical Society, 50(3), 677-680.