This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni0.9Ta0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni0.9Ta0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni0.9Ta0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.
|Number of pages||4|
|Journal||Journal of the Korean Physical Society|
|Publication status||Published - 2007 Mar 1|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)