In Situ FTIR Analysis for the Thermal Decompositions of Trimethylgallium and Trimethylgallium-Ammonia Adduct

Seong Han Kim, Hyang Sook Kim, Jin Soo Hwang, Joong Gill Choi, Paul Joe Chong

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

The thermal decompositions of trimethylgallium (TMG) and trimethylgallium-ammonia adduct (TMG:NH3) have been studied using Fourier transform infrared spectroscopy. A static cold-wall reactor is designed for use in the temperature range 25–1000 °C, and the gaseous reactants and products are in situ analyzed to obtain the kinetic information. TMG:NH3 as well as TMG is decomposed around 500 °C with liberation of the CH3 group. In the case of TMG:NH3, the CH3 group abstracts hydrogen from NH3, forming CH4. The decomposition of NH3 can be described as second-order kinetics, and that of TMG and TMG:NH3 as first-order kinetics. The decomposition rate constant of TMG:NH3 at 1.6 Torr is estimated to be log k1 = 15–63 (kcal/mol)/2.303RT.

Original languageEnglish
Pages (from-to)278-281
Number of pages4
JournalChemistry of Materials
Volume6
Issue number3
DOIs
Publication statusPublished - 1994 Mar 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Fingerprint Dive into the research topics of 'In Situ FTIR Analysis for the Thermal Decompositions of Trimethylgallium and Trimethylgallium-Ammonia Adduct'. Together they form a unique fingerprint.

  • Cite this