Abstract
We examined the influence of oxygen (O 2) on the growth of silicon carbide nanowires (SiC NWs) by chemical vapor deposition (CVD), because vacuum environments are susceptible to O 2 leakage inflow. We investigated the effect of increasing the O 2 flow rate on the microstructural changes of SiC NWs and then evaluated the effect at various growth temperatures. The O 2 content was highly related to the density of NWs, which continued to increase actively at higher temperatures. High-resolution transmission electron microscopy (HR-TEM) revealed that NWs change from a single-crystalline phase to a polycrystalline phase and then to a SiC/SiO 2 core-shell structure.
Original language | English |
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Pages (from-to) | 138-142 |
Number of pages | 5 |
Journal | Chemical Physics Letters |
Volume | 531 |
DOIs | |
Publication status | Published - 2012 Apr 2 |
Bibliographical note
Funding Information:This research was supported by the Agency for Defense Development (ADD) .
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
- Physical and Theoretical Chemistry