Influence of Si precursor type on the surface roughening of SiGe epitaxial layers deposited by ultrahigh vacuum chemical vapor deposition method

Youngmo Kim, Sungyeol Yoon, Daehong Ko, Hyunchul Sohn

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint Dive into the research topics of 'Influence of Si precursor type on the surface roughening of SiGe epitaxial layers deposited by ultrahigh vacuum chemical vapor deposition method'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy