Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition

Seok Kyun Song, Seok Keun Koh, Deuk Yeon Lee, Hong Koo Baik

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Abstract

The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar+ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5-29 Å lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, t, attained its maximum value at a deposition rate R = 1.0 Å/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number1 A/B
DOIs
Publication statusPublished - 2004 Jan 15

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All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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