Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate

C. Y. Kim, S. W. Cho, M. H. Cho, K. B. Chung, C. H. An, H. Kim, H. J. Lee, D. H. Ko

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Interfacial reaction of atomic-layer-deposited HfO<sub>2</sub> film as a function of the surface state of an n-GaAs (100) substrate'. Together they form a unique fingerprint.

Physics & Astronomy