Interfacial reactions between WN x/poly Si films with the annealing conditions were studied. High resolution transmission electron microscopy (HR-TEM) and X-ray photoelectron spectroscopy (XPS) were used. It was found that after short period of annealing the island-type precipitation was observed. The results also show that Si-N layer become thinner and island-type precipitation become a continuous layer when the annealing time was extended.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)