Interfacial reactions of Si/Co films on GaAs

J. S. Kwak, H. N. Kim, Hong Koo Baik, D. W. Shin, C. G. Park, C. S. Kim, S. K. Noh

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)408-410
Number of pages3
JournalJournal of Materials Science Letters
Volume14
Issue number6
DOIs
Publication statusPublished - 1995 Jan 1

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Semiconducting gallium arsenide
Semiconducting silicon
Film growth
Auger electron spectroscopy
X ray spectroscopy
Cobalt
Surface chemistry
Phase diagrams
Chemical reactions
Annealing
X ray diffraction
Thin films
gallium arsenide

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Kwak, J. S., Kim, H. N., Baik, H. K., Shin, D. W., Park, C. G., Kim, C. S., & Noh, S. K. (1995). Interfacial reactions of Si/Co films on GaAs. Journal of Materials Science Letters, 14(6), 408-410. https://doi.org/10.1007/BF00274555
Kwak, J. S. ; Kim, H. N. ; Baik, Hong Koo ; Shin, D. W. ; Park, C. G. ; Kim, C. S. ; Noh, S. K. / Interfacial reactions of Si/Co films on GaAs. In: Journal of Materials Science Letters. 1995 ; Vol. 14, No. 6. pp. 408-410.
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Kwak, JS, Kim, HN, Baik, HK, Shin, DW, Park, CG, Kim, CS & Noh, SK 1995, 'Interfacial reactions of Si/Co films on GaAs', Journal of Materials Science Letters, vol. 14, no. 6, pp. 408-410. https://doi.org/10.1007/BF00274555

Interfacial reactions of Si/Co films on GaAs. / Kwak, J. S.; Kim, H. N.; Baik, Hong Koo; Shin, D. W.; Park, C. G.; Kim, C. S.; Noh, S. K.

In: Journal of Materials Science Letters, Vol. 14, No. 6, 01.01.1995, p. 408-410.

Research output: Contribution to journalArticle

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AU - Noh, S. K.

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