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Interfacial self-Cleaning during PEALD HfO2 process on GaAs using TDMAH/O2 with different (NH4)2S cleaning time
Young Chul Byun, Chee Hong An, Ju Yun Choi, Chung Yi Kim, Mann Ho Cho, Hyoungsub Kim
Research output: Contribution to journal › Article › peer-review
8
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(Scopus)