Investigation of the alignment phenomena using a-C:H thin films for liquid crystal alignment materials

Soon Joon Rho, Day Kyu Lee, Hong Koo Baik, Jeoung Yeon Hwang, Yong Min Jo, Dae-Shik Seo

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

A high pretilt angle is generated by hydrogenated amorphous carbon (a-C:H) thin films treated with an ion beam method. a-C:H thin films are deposited by remote plasma enhanced chemical vapor deposition and are modified by an Ar ion beam at an incidence angle of 45° using an Kaufman ion gun. Ion beam irradiation results in the decrease of the thickness of a-C:H thin films and the increase of the sp 2 fraction. The optical transmittance of the ion beam irradiated a-C:H is more affected by thickness than sp 2 fraction. An excessive ion beam irradiation, 5 min Ar ion beam, results in the increase of the surface roughness of the a-C:H thin films and the pretilt angle has very low value. The pretilt angle is controlled by the thickness, sp 2 fraction and the surface roughness.

Original languageEnglish
Pages (from-to)259-262
Number of pages4
JournalThin Solid Films
Volume420-421
DOIs
Publication statusPublished - 2002 Dec 2

Fingerprint

Liquid Crystals
Liquid crystals
Ion beams
ion beams
liquid crystals
alignment
Thin films
thin films
surface roughness
Surface roughness
Irradiation
irradiation
Amorphous carbon
Opacity
Ion sources
Plasma enhanced chemical vapor deposition
transmittance
incidence
vapor deposition
carbon

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Rho, Soon Joon ; Lee, Day Kyu ; Baik, Hong Koo ; Hwang, Jeoung Yeon ; Jo, Yong Min ; Seo, Dae-Shik. / Investigation of the alignment phenomena using a-C:H thin films for liquid crystal alignment materials. In: Thin Solid Films. 2002 ; Vol. 420-421. pp. 259-262.
@article{7435770fb2a347009d3701ec6e575dc1,
title = "Investigation of the alignment phenomena using a-C:H thin films for liquid crystal alignment materials",
abstract = "A high pretilt angle is generated by hydrogenated amorphous carbon (a-C:H) thin films treated with an ion beam method. a-C:H thin films are deposited by remote plasma enhanced chemical vapor deposition and are modified by an Ar ion beam at an incidence angle of 45° using an Kaufman ion gun. Ion beam irradiation results in the decrease of the thickness of a-C:H thin films and the increase of the sp 2 fraction. The optical transmittance of the ion beam irradiated a-C:H is more affected by thickness than sp 2 fraction. An excessive ion beam irradiation, 5 min Ar ion beam, results in the increase of the surface roughness of the a-C:H thin films and the pretilt angle has very low value. The pretilt angle is controlled by the thickness, sp 2 fraction and the surface roughness.",
author = "Rho, {Soon Joon} and Lee, {Day Kyu} and Baik, {Hong Koo} and Hwang, {Jeoung Yeon} and Jo, {Yong Min} and Dae-Shik Seo",
year = "2002",
month = "12",
day = "2",
doi = "10.1016/S0040-6090(02)00754-X",
language = "English",
volume = "420-421",
pages = "259--262",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

Investigation of the alignment phenomena using a-C:H thin films for liquid crystal alignment materials. / Rho, Soon Joon; Lee, Day Kyu; Baik, Hong Koo; Hwang, Jeoung Yeon; Jo, Yong Min; Seo, Dae-Shik.

In: Thin Solid Films, Vol. 420-421, 02.12.2002, p. 259-262.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Investigation of the alignment phenomena using a-C:H thin films for liquid crystal alignment materials

AU - Rho, Soon Joon

AU - Lee, Day Kyu

AU - Baik, Hong Koo

AU - Hwang, Jeoung Yeon

AU - Jo, Yong Min

AU - Seo, Dae-Shik

PY - 2002/12/2

Y1 - 2002/12/2

N2 - A high pretilt angle is generated by hydrogenated amorphous carbon (a-C:H) thin films treated with an ion beam method. a-C:H thin films are deposited by remote plasma enhanced chemical vapor deposition and are modified by an Ar ion beam at an incidence angle of 45° using an Kaufman ion gun. Ion beam irradiation results in the decrease of the thickness of a-C:H thin films and the increase of the sp 2 fraction. The optical transmittance of the ion beam irradiated a-C:H is more affected by thickness than sp 2 fraction. An excessive ion beam irradiation, 5 min Ar ion beam, results in the increase of the surface roughness of the a-C:H thin films and the pretilt angle has very low value. The pretilt angle is controlled by the thickness, sp 2 fraction and the surface roughness.

AB - A high pretilt angle is generated by hydrogenated amorphous carbon (a-C:H) thin films treated with an ion beam method. a-C:H thin films are deposited by remote plasma enhanced chemical vapor deposition and are modified by an Ar ion beam at an incidence angle of 45° using an Kaufman ion gun. Ion beam irradiation results in the decrease of the thickness of a-C:H thin films and the increase of the sp 2 fraction. The optical transmittance of the ion beam irradiated a-C:H is more affected by thickness than sp 2 fraction. An excessive ion beam irradiation, 5 min Ar ion beam, results in the increase of the surface roughness of the a-C:H thin films and the pretilt angle has very low value. The pretilt angle is controlled by the thickness, sp 2 fraction and the surface roughness.

UR - http://www.scopus.com/inward/record.url?scp=17944396841&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17944396841&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(02)00754-X

DO - 10.1016/S0040-6090(02)00754-X

M3 - Article

VL - 420-421

SP - 259

EP - 262

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -