Investigation of the surface chemical and electronic states of pyridine-capped CdSe nanocrystal films after plasma treatments using H 2, O2, and Ar gases

Seok Joo Wang, Hyuncheol Kim, Hyung-Ho Park, Young Su Lee, Hyeongtag Jeon, Ho Jung Chang

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Surface chemical bonding and the electronic states of pyridine-capped CdSe nanocrystal films were evaluated using x-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy before and after plasma treatments using H2, O2, and Ar gases from the viewpoint of studying the effects of surface capping organic molecules and surface oxidation. Surface capping organic molecules could be removed during the plasma treatment due to the chemical reactivity, ion energy transfer, and vacuum UV (VUV) of the plasma gases. With O2plasma treatment, surface capping organic molecules were effectively removed but substantial oxidation of CdSe occurred during the plasma treatment. The valence band maximum energy (EVBM) of CdSe nanocrystal films mainly depends on the apparent size of pyridine-capped CdSe nanocrystals, which controls the interparticle distance, and also on the oxidation of CdSe nanocrystals. Cd-rich surface in O2 and H 2 plasma treatments partially would compensate for the decrease in EVBM. After Ar plasma treatment, the smallest value of E VBM resulted from high VUV photon flux, short wavelength, and ion energy transfer. The surface bonding states of CdSe had a strong influence on the electronic structure with the efficient strip of capping molecules as well as different surface oxidations and surface capping molecule contents.

Original languageEnglish
Pages (from-to)559-563
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume28
Issue number4
DOIs
Publication statusPublished - 2010 Jul 1

Fingerprint

Electronic states
Pyridine
Nanocrystals
pyridines
nanocrystals
Gases
Plasmas
electronics
gases
Molecules
Oxidation
oxidation
molecules
Energy transfer
energy transfer
photoelectron spectroscopy
Vacuum
Plasma Gases
Ions
Ultraviolet photoelectron spectroscopy

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

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title = "Investigation of the surface chemical and electronic states of pyridine-capped CdSe nanocrystal films after plasma treatments using H 2, O2, and Ar gases",
abstract = "Surface chemical bonding and the electronic states of pyridine-capped CdSe nanocrystal films were evaluated using x-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy before and after plasma treatments using H2, O2, and Ar gases from the viewpoint of studying the effects of surface capping organic molecules and surface oxidation. Surface capping organic molecules could be removed during the plasma treatment due to the chemical reactivity, ion energy transfer, and vacuum UV (VUV) of the plasma gases. With O2plasma treatment, surface capping organic molecules were effectively removed but substantial oxidation of CdSe occurred during the plasma treatment. The valence band maximum energy (EVBM) of CdSe nanocrystal films mainly depends on the apparent size of pyridine-capped CdSe nanocrystals, which controls the interparticle distance, and also on the oxidation of CdSe nanocrystals. Cd-rich surface in O2 and H 2 plasma treatments partially would compensate for the decrease in EVBM. After Ar plasma treatment, the smallest value of E VBM resulted from high VUV photon flux, short wavelength, and ion energy transfer. The surface bonding states of CdSe had a strong influence on the electronic structure with the efficient strip of capping molecules as well as different surface oxidations and surface capping molecule contents.",
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Investigation of the surface chemical and electronic states of pyridine-capped CdSe nanocrystal films after plasma treatments using H 2, O2, and Ar gases. / Wang, Seok Joo; Kim, Hyuncheol; Park, Hyung-Ho; Lee, Young Su; Jeon, Hyeongtag; Chang, Ho Jung.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 28, No. 4, 01.07.2010, p. 559-563.

Research output: Contribution to journalArticle

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