Iridium oxide as a stimulating neural electrode formed by reactive magnetron sputtering

I. S. Lee, J. M. Park, H. J. Son, Jongchul Park, G. H. Lee, Y. H. Lee, F. Z. Cui

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Implantable neural prostheses form hybrid interfaces with biological constructs, and the application of electrical fields can restore functions of patients with neurological damages. The various stoichiometric compositions of iridium oxide were synthesized using reactive magnetron sputtering. The charge injection behavior of iridium oxide deposited with an O2/Ar ratio of 0.5 was similar to pure Ir. The charge density of iridium oxide increased with increasing O2/Ar ratio, and increasing thickness of iridium oxide.

Original languageEnglish
Pages (from-to)307-310
Number of pages4
JournalKey Engineering Materials
Volume288-289
Publication statusPublished - 2005 Dec 1

Fingerprint

Reactive sputtering
Iridium
Magnetron sputtering
Electrodes
Oxides
Neural prostheses
Charge injection
Charge density
iridium oxide
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Lee, I. S., Park, J. M., Son, H. J., Park, J., Lee, G. H., Lee, Y. H., & Cui, F. Z. (2005). Iridium oxide as a stimulating neural electrode formed by reactive magnetron sputtering. Key Engineering Materials, 288-289, 307-310.
Lee, I. S. ; Park, J. M. ; Son, H. J. ; Park, Jongchul ; Lee, G. H. ; Lee, Y. H. ; Cui, F. Z. / Iridium oxide as a stimulating neural electrode formed by reactive magnetron sputtering. In: Key Engineering Materials. 2005 ; Vol. 288-289. pp. 307-310.
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Lee, IS, Park, JM, Son, HJ, Park, J, Lee, GH, Lee, YH & Cui, FZ 2005, 'Iridium oxide as a stimulating neural electrode formed by reactive magnetron sputtering', Key Engineering Materials, vol. 288-289, pp. 307-310.

Iridium oxide as a stimulating neural electrode formed by reactive magnetron sputtering. / Lee, I. S.; Park, J. M.; Son, H. J.; Park, Jongchul; Lee, G. H.; Lee, Y. H.; Cui, F. Z.

In: Key Engineering Materials, Vol. 288-289, 01.12.2005, p. 307-310.

Research output: Contribution to journalArticle

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