Keystone error analysis of projection optics in a maskless lithography system

Dong Won Kang; Minwook Kang; Jae Won Hahn

doi:10.1007/s12541-015-0049-6

Keystone error analysis of projection optics in a maskless lithography system

Dong Won Kang, Minwook Kang, Jae Won Hahn

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm² square object. We also analyze the influence of the keystone error on the stitch error.

Original language	English
Pages (from-to)	373-378
Number of pages	6
Journal	International Journal of Precision Engineering and Manufacturing
Volume	16
Issue number	2
DOIs	https://doi.org/10.1007/s12541-015-0049-6
Publication status	Published - 2015 Feb

Bibliographical note

Publisher Copyright:
© 2015, Korean Society for Precision Engineering and Springer-Verlag Berlin Heidelberg.

All Science Journal Classification (ASJC) codes

Mechanical Engineering
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

Access to Document

10.1007/s12541-015-0049-6

Cite this

@article{3cb6f8b6b06e4556babb4d26ab352404,

title = "Keystone error analysis of projection optics in a maskless lithography system",

abstract = "In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm2 square object. We also analyze the influence of the keystone error on the stitch error.",

author = "Kang, {Dong Won} and Minwook Kang and Hahn, {Jae Won}",

note = "Publisher Copyright: {\textcopyright} 2015, Korean Society for Precision Engineering and Springer-Verlag Berlin Heidelberg.",

year = "2015",

month = feb,

doi = "10.1007/s12541-015-0049-6",

language = "English",

volume = "16",

pages = "373--378",

journal = "International Journal of Precision Engineering and Manufacturing",

issn = "1229-8557",

publisher = "Korean Society of Precision Engineering",

number = "2",

}

TY - JOUR

T1 - Keystone error analysis of projection optics in a maskless lithography system

AU - Kang, Dong Won

AU - Kang, Minwook

AU - Hahn, Jae Won

PY - 2015/2

Y1 - 2015/2

N2 - In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm2 square object. We also analyze the influence of the keystone error on the stitch error.

AB - In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm2 square object. We also analyze the influence of the keystone error on the stitch error.

UR - http://www.scopus.com/inward/record.url?scp=84924812583&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84924812583&partnerID=8YFLogxK

U2 - 10.1007/s12541-015-0049-6

DO - 10.1007/s12541-015-0049-6

M3 - Article

AN - SCOPUS:84924812583

SN - 1229-8557

VL - 16

SP - 373

EP - 378

JO - International Journal of Precision Engineering and Manufacturing

JF - International Journal of Precision Engineering and Manufacturing

IS - 2

ER -

Keystone error analysis of projection optics in a maskless lithography system

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this