Keystone error analysis of projection optics in a maskless lithography system

Dong Won Kang, Minwook Kang, Jae Won Hahn

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm2 square object. We also analyze the influence of the keystone error on the stitch error.

Original languageEnglish
Pages (from-to)373-378
Number of pages6
JournalInternational Journal of Precision Engineering and Manufacturing
Volume16
Issue number2
DOIs
Publication statusPublished - 2015 Jan 1

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Error analysis
Lithography
Optics
Optical systems
Experiments

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Mechanical Engineering

Cite this

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Keystone error analysis of projection optics in a maskless lithography system. / Kang, Dong Won; Kang, Minwook; Hahn, Jae Won.

In: International Journal of Precision Engineering and Manufacturing, Vol. 16, No. 2, 01.01.2015, p. 373-378.

Research output: Contribution to journalArticle

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