Large-Area Assembly of Densely Aligned Single-Walled Carbon Nanotubes Using Solution Shearing and Their Application to Field-Effect Transistors

Steve Park, Gregory Pitner, Gaurav Giri, Ja Hoon Koo, Joonsuk Park, Kwanpyo Kim, Huiliang Wang, Robert Sinclair, H. S.Philip Wong, Zhenan Bao

Research output: Contribution to journalArticlepeer-review

96 Citations (Scopus)

Abstract

Dense alignment of single-walled carbon nanotubes over a large area is demonstrated using a novel solution-shearing technique. A density of 150-200 single-walled carbon nanotubes per micrometer is achieved with a current density of 10.08 μA μm-1 at VDS = -1 V. The on-current density is improved by a factor of 45 over that of random-network single-walled carbon nanotubes.

Original languageEnglish
Pages (from-to)2656-2662
Number of pages7
JournalAdvanced Materials
Volume27
Issue number16
DOIs
Publication statusPublished - 2015 Apr 24

Bibliographical note

Funding Information:
S.P. and G.P. contributed equally to this work. This work was supported in part by Systems On Nanoscale Information fabriCs (SONIC), one of the six SRC STARnet centers sponsored by MARCO and DARPA, and National Science Foundation (Grant Number 1059020). The authors are grateful to the Stanford Nanofabrication Facility, where this work was fabricated, in particular to Jim Haydon and Mike Dickey for their technical assistance. Note: Prof. H.-S. P. Wong was mistakenly omitted as a corresponding author when this work was first published. This was corrected on April 21, 2015.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint

Dive into the research topics of 'Large-Area Assembly of Densely Aligned Single-Walled Carbon Nanotubes Using Solution Shearing and Their Application to Field-Effect Transistors'. Together they form a unique fingerprint.

Cite this