Abstract
We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermo-elastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatially-modulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.
Original language | English |
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Pages (from-to) | 163-168 |
Number of pages | 6 |
Journal | Journal of Korean Institute of Metals and Materials |
Volume | 48 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2010 Feb |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Modelling and Simulation
- Surfaces, Coatings and Films
- Metals and Alloys