Laser-driven high-resolution patterning of indium tin oxide thin film for electronic device

Hyunkwon Shin, Boyeon Sim, Myeongkyu Lee

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We here introduce a laser-driven process to pattern transparent thin films on transparent substrates. This method utilizes a pre-patterned metal film as the dynamic release layer and the transparent thin film is selectively removed by a thermo-elastic force laser-induced in the underlying metal layer. High-fidelity indium tin oxide (ITO) thin film patterns were fabricated on plastic and glass substrates using a pulsed Nd:YAG laser. Tens of square centimeters could be patterned with several pulse shots. We fabricated a pentacene thin film transistor with ITO source and drain electrodes and observed a very low off-current level. This tells that the channel area between ITO electrodes was completely etched out by this laser-driven process. Combined with the absence of photoresist and chemical etching steps, this method provides a simple high-resolution route to pattern transparent thin films over large areas at low temperatures.

Original languageEnglish
Pages (from-to)816-820
Number of pages5
JournalOptics and Lasers in Engineering
Volume48
Issue number7-8
DOIs
Publication statusPublished - 2010 Jul 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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