Liquid crystal (LC) alignment on various HfZrO films as a function of Hf concentration was studied. In the HfZrO system, Hf can act as a supporter to produce a uniform alignment layer. From pre-tilt measurement, LC cells with 5% and 10% Hf were optimized to perform as a device. By X-ray photoelectron spectroscopy (XPS) analysis, the proper amount of Hf addition in the ZrO system resulted in less oxygen vacancies which caused the LCs to be orientated more uniformly. However, too much Hf led to degradation of the LC cells due to the formation of HfO2 in the HfZrO films.
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© 2014 The Electrochemical Society.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials