Abstract
We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.
Original language | English |
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Pages (from-to) | L1280-L1282 |
Journal | Japanese Journal of Applied Physics |
Volume | 45 |
Issue number | 46-50 |
DOIs | |
Publication status | Published - 2006 Dec |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)