Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiO_x thin film obliquely deposited by sputtering

We studied the effects of liquid crystal (LC) alignment characteristics on a SiO_x thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiO_x thin film, and the pretilt angle was about 90°. The thermal stability of the SiO_x thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiO_x thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO _x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.