Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering

Sung Ho Choi, Jeoung Yeon Hwang, Sungyeon Kim, Byeong Yun Oh, Jae Min Myoung, Dae-Shik Seo

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12 Citations (Scopus)

Abstract

We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume45
Issue number46-50
DOIs
Publication statusPublished - 2006 Dec 1

Fingerprint

Liquid crystal displays
Liquid crystals
Sputtering
sputtering
liquid crystals
alignment
Thin films
thin films
Thermodynamic stability
thermal stability

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

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title = "Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering",
abstract = "We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.",
author = "Choi, {Sung Ho} and Hwang, {Jeoung Yeon} and Sungyeon Kim and Oh, {Byeong Yun} and Myoung, {Jae Min} and Dae-Shik Seo",
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T1 - Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering

AU - Choi, Sung Ho

AU - Hwang, Jeoung Yeon

AU - Kim, Sungyeon

AU - Oh, Byeong Yun

AU - Myoung, Jae Min

AU - Seo, Dae-Shik

PY - 2006/12/1

Y1 - 2006/12/1

N2 - We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

AB - We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

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