Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering

Sung Ho Choi; Jeoung Yeon Hwang; Sungyeon Kim; Byeong Yun Oh; Jae Min Myoung; Dae Shik Seo

doi:10.1143/JJAP.45.L1280

Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiO_x thin film obliquely deposited by sputtering

Sung Ho Choi, Jeoung Yeon Hwang, Sungyeon Kim, Byeong Yun Oh, Jae Min Myoung, Dae Shik Seo

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

We studied the effects of liquid crystal (LC) alignment characteristics on a SiO_x thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiO_x thin film, and the pretilt angle was about 90°. The thermal stability of the SiO_x thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiO_x thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO _x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

Original language	English
Pages (from-to)	L1280-L1282
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	45
Issue number	46-50
DOIs	https://doi.org/10.1143/JJAP.45.L1280
Publication status	Published - 2006 Dec

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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@article{4d02eecaeef64e1f916a4e5c555bc51c,

title = "Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering",

abstract = "We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.",

author = "Choi, {Sung Ho} and Hwang, {Jeoung Yeon} and Sungyeon Kim and Oh, {Byeong Yun} and Myoung, {Jae Min} and Seo, {Dae Shik}",

year = "2006",

month = dec,

doi = "10.1143/JJAP.45.L1280",

language = "English",

volume = "45",

pages = "L1280--L1282",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

issn = "0021-4922",

number = "46-50",

}

Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiO_x thin film obliquely deposited by sputtering. / Choi, Sung Ho; Hwang, Jeoung Yeon; Kim, Sungyeon; Oh, Byeong Yun; Myoung, Jae Min ; Seo, Dae Shik.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 45, No. 46-50, 12.2006, p. L1280-L1282.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Liquid crystal alignment and electrooptical characteristics of vertical alignment liquid crystal display on SiOx thin film obliquely deposited by sputtering

AU - Choi, Sung Ho

AU - Hwang, Jeoung Yeon

AU - Kim, Sungyeon

AU - Oh, Byeong Yun

AU - Myoung, Jae Min

AU - Seo, Dae Shik

PY - 2006/12

Y1 - 2006/12

N2 - We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

AB - We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200°C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiO x thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

UR - http://www.scopus.com/inward/record.url?scp=34547902878&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34547902878&partnerID=8YFLogxK

U2 - 10.1143/JJAP.45.L1280

DO - 10.1143/JJAP.45.L1280

M3 - Article

AN - SCOPUS:34547902878

VL - 45

SP - L1280-L1282

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

SN - 0021-4922

IS - 46-50