Liquid crystal alignment capability by the UV alignment method in a-C:H thin films

Jeoung Yeon Hwang, Yong Min Jo, Dae Shik Seo, Jin Jang

Research output: Contribution to journalLetter

12 Citations (Scopus)

Abstract

We studied the nematic liquid crystal (NLC) alignment capability by the UV alignment method on a a-C:H thin-film surface. A good LC alignment by UV irradiation on a a-C:H thin-film surface at a layer thickness of 200 Å was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at an annealing temperature of 180°C However, the alignment defect of the NLC was observed at an annealing temperature above 200°C Consequently, a good thermal stability of LC alignment by the UV alignment method on the a-C:H thin-film surface can be achieved.

Original languageEnglish
Pages (from-to)L114-L116
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number2 A
DOIs
Publication statusPublished - 2003 Feb 1

Fingerprint

Liquid crystals
liquid crystals
alignment
Thin films
thin films
Nematic liquid crystals
Annealing
annealing
Thermodynamic stability
thermal stability
Irradiation
Temperature
Defects
irradiation
temperature
defects

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

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title = "Liquid crystal alignment capability by the UV alignment method in a-C:H thin films",
abstract = "We studied the nematic liquid crystal (NLC) alignment capability by the UV alignment method on a a-C:H thin-film surface. A good LC alignment by UV irradiation on a a-C:H thin-film surface at a layer thickness of 200 {\AA} was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at an annealing temperature of 180°C However, the alignment defect of the NLC was observed at an annealing temperature above 200°C Consequently, a good thermal stability of LC alignment by the UV alignment method on the a-C:H thin-film surface can be achieved.",
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journal = "Japanese Journal of Applied Physics, Part 2: Letters",
issn = "0021-4922",
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Liquid crystal alignment capability by the UV alignment method in a-C:H thin films. / Hwang, Jeoung Yeon; Jo, Yong Min; Seo, Dae Shik; Jang, Jin.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 42, No. 2 A, 01.02.2003, p. L114-L116.

Research output: Contribution to journalLetter

TY - JOUR

T1 - Liquid crystal alignment capability by the UV alignment method in a-C:H thin films

AU - Hwang, Jeoung Yeon

AU - Jo, Yong Min

AU - Seo, Dae Shik

AU - Jang, Jin

PY - 2003/2/1

Y1 - 2003/2/1

N2 - We studied the nematic liquid crystal (NLC) alignment capability by the UV alignment method on a a-C:H thin-film surface. A good LC alignment by UV irradiation on a a-C:H thin-film surface at a layer thickness of 200 Å was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at an annealing temperature of 180°C However, the alignment defect of the NLC was observed at an annealing temperature above 200°C Consequently, a good thermal stability of LC alignment by the UV alignment method on the a-C:H thin-film surface can be achieved.

AB - We studied the nematic liquid crystal (NLC) alignment capability by the UV alignment method on a a-C:H thin-film surface. A good LC alignment by UV irradiation on a a-C:H thin-film surface at a layer thickness of 200 Å was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at an annealing temperature of 180°C However, the alignment defect of the NLC was observed at an annealing temperature above 200°C Consequently, a good thermal stability of LC alignment by the UV alignment method on the a-C:H thin-film surface can be achieved.

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DO - 10.1143/JJAP.42.L114

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SP - L114-L116

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

SN - 0021-4922

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