Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter

Sung Ho Choi, Byeong Yun Oh, Byoung Yong Kim, Jeong Min Han, Jin Woo Han, Chul Ho Ok, Sang Keuk Lee, Jeoung Yeon Hwang, Dae-Shik Seo

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Applying inorganic thin film to liquid crystal (LC) alignment layer has been observed for the alternative of the LC alignment method. In this study, LC alignment characteristics of the nitrogen doped diamond like carbon (NDLC) thin film which was deposited using different deposition method-sputtering and plasma enhanced chemical vapor deposition (PECVD) system was investigated. The difference of the thin film deposition method and the rate of composition gas can affect the LC alignment. The NDLC thin film that was deposited using sputter showed uniform LC alignment at the 1200eV of the ion beam intensity while the NDLC thin film that was deposited using PECVD showed uniform LC alignment at the 1800eV of the ion beam intensity in our previous research. The uppermost of the thermal stability of NDLC thin film was 200C. However, NDLC thin film deposited using sputter showed stability at high temperature, compared with NDLC thin film deposited using sputter.

Original languageEnglish
Pages (from-to)3-9
Number of pages7
JournalMolecular Crystals and Liquid Crystals
Volume480
Issue number1
DOIs
Publication statusPublished - 2008 Feb 28

Fingerprint

Liquid Crystals
Diamond
Carbon films
Plasma enhanced chemical vapor deposition
Liquid crystals
Diamonds
Nitrogen
diamonds
liquid crystals
alignment
vapor deposition
nitrogen
Thin films
carbon
thin films
Ion beams
ion beams
gas composition
Sputtering
Thermodynamic stability

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Choi, Sung Ho ; Oh, Byeong Yun ; Kim, Byoung Yong ; Han, Jeong Min ; Han, Jin Woo ; Ok, Chul Ho ; Lee, Sang Keuk ; Hwang, Jeoung Yeon ; Seo, Dae-Shik. / Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter. In: Molecular Crystals and Liquid Crystals. 2008 ; Vol. 480, No. 1. pp. 3-9.
@article{36d59b29a9254f81815ba0a2fd36f0e8,
title = "Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter",
abstract = "Applying inorganic thin film to liquid crystal (LC) alignment layer has been observed for the alternative of the LC alignment method. In this study, LC alignment characteristics of the nitrogen doped diamond like carbon (NDLC) thin film which was deposited using different deposition method-sputtering and plasma enhanced chemical vapor deposition (PECVD) system was investigated. The difference of the thin film deposition method and the rate of composition gas can affect the LC alignment. The NDLC thin film that was deposited using sputter showed uniform LC alignment at the 1200eV of the ion beam intensity while the NDLC thin film that was deposited using PECVD showed uniform LC alignment at the 1800eV of the ion beam intensity in our previous research. The uppermost of the thermal stability of NDLC thin film was 200C. However, NDLC thin film deposited using sputter showed stability at high temperature, compared with NDLC thin film deposited using sputter.",
author = "Choi, {Sung Ho} and Oh, {Byeong Yun} and Kim, {Byoung Yong} and Han, {Jeong Min} and Han, {Jin Woo} and Ok, {Chul Ho} and Lee, {Sang Keuk} and Hwang, {Jeoung Yeon} and Dae-Shik Seo",
year = "2008",
month = "2",
day = "28",
doi = "10.1080/15421400701821093",
language = "English",
volume = "480",
pages = "3--9",
journal = "Molecular Crystals and Liquid Crystals",
issn = "1542-1406",
publisher = "Taylor and Francis Ltd.",
number = "1",

}

Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter. / Choi, Sung Ho; Oh, Byeong Yun; Kim, Byoung Yong; Han, Jeong Min; Han, Jin Woo; Ok, Chul Ho; Lee, Sang Keuk; Hwang, Jeoung Yeon; Seo, Dae-Shik.

In: Molecular Crystals and Liquid Crystals, Vol. 480, No. 1, 28.02.2008, p. 3-9.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter

AU - Choi, Sung Ho

AU - Oh, Byeong Yun

AU - Kim, Byoung Yong

AU - Han, Jeong Min

AU - Han, Jin Woo

AU - Ok, Chul Ho

AU - Lee, Sang Keuk

AU - Hwang, Jeoung Yeon

AU - Seo, Dae-Shik

PY - 2008/2/28

Y1 - 2008/2/28

N2 - Applying inorganic thin film to liquid crystal (LC) alignment layer has been observed for the alternative of the LC alignment method. In this study, LC alignment characteristics of the nitrogen doped diamond like carbon (NDLC) thin film which was deposited using different deposition method-sputtering and plasma enhanced chemical vapor deposition (PECVD) system was investigated. The difference of the thin film deposition method and the rate of composition gas can affect the LC alignment. The NDLC thin film that was deposited using sputter showed uniform LC alignment at the 1200eV of the ion beam intensity while the NDLC thin film that was deposited using PECVD showed uniform LC alignment at the 1800eV of the ion beam intensity in our previous research. The uppermost of the thermal stability of NDLC thin film was 200C. However, NDLC thin film deposited using sputter showed stability at high temperature, compared with NDLC thin film deposited using sputter.

AB - Applying inorganic thin film to liquid crystal (LC) alignment layer has been observed for the alternative of the LC alignment method. In this study, LC alignment characteristics of the nitrogen doped diamond like carbon (NDLC) thin film which was deposited using different deposition method-sputtering and plasma enhanced chemical vapor deposition (PECVD) system was investigated. The difference of the thin film deposition method and the rate of composition gas can affect the LC alignment. The NDLC thin film that was deposited using sputter showed uniform LC alignment at the 1200eV of the ion beam intensity while the NDLC thin film that was deposited using PECVD showed uniform LC alignment at the 1800eV of the ion beam intensity in our previous research. The uppermost of the thermal stability of NDLC thin film was 200C. However, NDLC thin film deposited using sputter showed stability at high temperature, compared with NDLC thin film deposited using sputter.

UR - http://www.scopus.com/inward/record.url?scp=39649100156&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=39649100156&partnerID=8YFLogxK

U2 - 10.1080/15421400701821093

DO - 10.1080/15421400701821093

M3 - Article

VL - 480

SP - 3

EP - 9

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

SN - 1542-1406

IS - 1

ER -