Liquid crystal alignment characteristics on the NDLC thin film deposited using PECVD and sputter

Sung Ho Choi, Byeong Yun Oh, Byoung Yong Kim, Jeong Min Han, Jin Woo Han, Chul Ho Ok, Sang Keuk Lee, Jeoung Yeon Hwang, Dae Shik Seo

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Applying inorganic thin film to liquid crystal (LC) alignment layer has been observed for the alternative of the LC alignment method. In this study, LC alignment characteristics of the nitrogen doped diamond like carbon (NDLC) thin film which was deposited using different deposition method-sputtering and plasma enhanced chemical vapor deposition (PECVD) system was investigated. The difference of the thin film deposition method and the rate of composition gas can affect the LC alignment. The NDLC thin film that was deposited using sputter showed uniform LC alignment at the 1200eV of the ion beam intensity while the NDLC thin film that was deposited using PECVD showed uniform LC alignment at the 1800eV of the ion beam intensity in our previous research. The uppermost of the thermal stability of NDLC thin film was 200C. However, NDLC thin film deposited using sputter showed stability at high temperature, compared with NDLC thin film deposited using sputter.

Original languageEnglish
Pages (from-to)3-9
Number of pages7
JournalMolecular Crystals and Liquid Crystals
Volume480
Issue number1
DOIs
Publication statusPublished - 2008 Feb 28

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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