Liquid crystal alignment on the SiC thin film by the ion beam exposure method

Hyun Chan Moon, Hyung Ku Kang, Chang Joon Park, Jeoung Yeon Hwang, Dao Shik Seo, Sung Hoon Lim, Jin Jang

Research output: Contribution to journalConference article

Abstract

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability makes SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by ion beam exposure on the SiC thin film surface was achieved. The about 87° of stable pretilt angle was achieved at the range from 30° to 45° of incident angle. The good LC alignment is main-tained by the ion beam alignment method on the SiC thin film surface at high annealing temperatures up to 300.

Original languageEnglish
Pages (from-to)468-470
Number of pages3
JournalProceedings of International Meeting on Information Display
Volume1
Publication statusPublished - 2006 Dec 1
Event5th International Meeting on Information Display - Seoul, Korea, Republic of
Duration: 2005 Jul 192005 Jul 23

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Moon, H. C., Kang, H. K., Park, C. J., Hwang, J. Y., Seo, D. S., Lim, S. H., & Jang, J. (2006). Liquid crystal alignment on the SiC thin film by the ion beam exposure method. Proceedings of International Meeting on Information Display, 1, 468-470.