Lithography-free fabrication of large area subwavelength antireflection structures using thermally dewetted Pt/Pd alloy etch mask

Youngjae Lee, Kisik Koh, Hyungjoo Na, Kwanoh Kim, Jeong Jin Kang, Jongbaeg Kim

Research output: Contribution to journalArticle

46 Citations (Scopus)

Abstract

We have demonstrated lithography-free, simple, and large area fabrication method for subwavelength antireflection structures (SAS) to achieve low reflectance of silicon (Si) surface. Thin film of Pt/Pd alloy on a Si substrate is melted and agglomerated into hemispheric nanodots by thermal dewetting process, and the array of the nanodots is used as etch mask for reactive ion etching (RIE) to form SAS on the Si surface. Two critical parameters, the temperature of thermal dewetting processes and the duration of RIE, have been experimentally studied to achieve very low reflectance from SAS. All the SAS have well-tapered shapes that the refractive index may be changed continuously and monotonously in the direction of incident light. In the wavelength range from 350 to 1800 nm, the measured reflectance of the fabricated SAS averages out to 5%. Especially in the wavelength range from 550 to 650 nm, which falls within visible light, the measured reflectance is under 0.01%.

Original languageEnglish
Pages (from-to)364-370
Number of pages7
JournalNanoscale Research Letters
Volume4
Issue number4
DOIs
Publication statusPublished - 2009 Apr 1

Fingerprint

Lithography
Masks
Silicon
masks
lithography
reflectance
Fabrication
fabrication
Reactive ion etching
drying
silicon
etching
Wavelength
wavelengths
Refractive index
ions
refractivity
Thin films
Substrates
thin films

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Lee, Youngjae ; Koh, Kisik ; Na, Hyungjoo ; Kim, Kwanoh ; Kang, Jeong Jin ; Kim, Jongbaeg. / Lithography-free fabrication of large area subwavelength antireflection structures using thermally dewetted Pt/Pd alloy etch mask. In: Nanoscale Research Letters. 2009 ; Vol. 4, No. 4. pp. 364-370.
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Lithography-free fabrication of large area subwavelength antireflection structures using thermally dewetted Pt/Pd alloy etch mask. / Lee, Youngjae; Koh, Kisik; Na, Hyungjoo; Kim, Kwanoh; Kang, Jeong Jin; Kim, Jongbaeg.

In: Nanoscale Research Letters, Vol. 4, No. 4, 01.04.2009, p. 364-370.

Research output: Contribution to journalArticle

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