Lithography-free fabrication of single crystalline silicon tubular nanostructures on large area

Hak Kyun Jung, Jungwook Choi, Hyungjoo Na, Dae Sung Kwon, Min Ook Kim, Jeong Jin Kang, Jongbaeg Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)


A novel method to fabricate single-crystalline silicon tubular nanostructures on large area was developed. Utilizing the thermal dewetting of a thin metal film, redeposition of dewetted metal nanodots, and etch selectivity between silicon substrate and metal masks, the tubular nanostructures were formed from single crystalline silicon substrate on large area without using any nano-patterning process. This lithography-free fabrication method composed only of sputtering, rapid thermal process and reactive ion etch (RIE) is simple and cost effective batch-process. The transmission electron microscopic inspection revealed that the silicon tubular nanostructures are in the range of 1 μm in length, 250 nm in diameter, 75 nm in wall-thickness and 380 nm in hollow-depth.

Original languageEnglish
Pages (from-to)325-328
Number of pages4
JournalMicroelectronic Engineering
Publication statusPublished - 2012 Oct

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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