A transparent thin film transistor (TTFT), including zinc oxide (ZnO), has come into the spotlight as an innovative TFT that has the potential to drive the future of the information technology industry. Herein, we developed a new direct patterning method, drop-casting with a new developing method, through the combination of an aqueous ammonia-ZnO process with the doping of Na ions and surface engineering for high n-type semiconducting performance with good operational stability at low temperature. In particular, the effective decomposition and removal of the residual ammonia compounds using methanol have a successful effect on both intrinsic and Na doped ZnO precursor processes for TFTs and they showed the extensive possibility of ammonia based metal oxide precursor solutions. In this method, the Na doped ZnO TTFTs showed good operational stability even with the process of low temperature sintering. The mobility μ = 0.80 cm 2 V -1 s -1 was obtained at 200 °C sintering and the mobility μ = 0.10 cm 2 V -1 s -1 at 100 °C sintering. In addition, in ambient conditions, the patterned Na doped ZnO TTFT exhibited high electron mobility μ = 1.84 cm 2 V -1 s -1 with excellent device operational stability and scant hysteresis with sintering at 300 °C. This method is not only simple as compared with photolithography and inkjet printing, but is also a sophisticated patterning process with good fidelity for solution-processed ZnO TFTs. Moreover, the proposed method can be extended to plastic substrates on a large scale because of the low temperature development process of the ammonia-ZnO precursor using methanol and continuous patterning at ambient conditions. We believe that this method can be adapted to the advanced process toward future printed transparent electronic devices.
All Science Journal Classification (ASJC) codes
- Materials Chemistry