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Low temperature atomic layer deposition of ruthenium thin films using isopropylmethylbenzene-cyclohexadiene-ruthenium and O2
Tae Kwang Eom, Windu Sari, Kyu Jeong Choi, Woong Chul Shin, Jae Hyun Kim, Do Joong Lee, Ki Bum Kim, Hyunchul Sohn, Soo Hyun Kim
Research output: Contribution to journal › Article › peer-review
63
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(Scopus)