Original language | English |
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Journal | Scientific Reports |
Publication status | Accepted/In press - 2017 Nov |
Low-temperature fabrication of an HfO2 passivation layer for amorphous indiu-gallium-zinc oxide thin film transistors using a solution process
Seonghwan Hong, Sung Pyo Park, Yeong Gyu Kim, Byung Ha Kang, Jae Won Na, Heon Je Kim
Research output: Contribution to journal › Article › peer-review