Low-temperature fabrication of an HfO2 passivation layer for amorphous indiu-gallium-zinc oxide thin film transistors using a solution process

Seonghwan Hong, Sung Pyo Park, Yeong Gyu Kim, Byung Ha Kang, Jae Won Na, Heon Je Kim

Research output: Contribution to journalArticle

Original languageEnglish
JournalScientific Reports
Publication statusAccepted/In press - 2017 Nov

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