Low temperature grown polycrystalline La0.7 Sr0.3 Mn O3 thin films on amorphous Si O2 substrates by rf magnetron sputtering

Sun Gyu Choi, A. Sivasankar Reddy, Hyung Ho Park, Woo Seok Yang, Hojun Ryu, Byoung Gon Yu

Research output: Contribution to journalArticle

3 Citations (Scopus)


The La0.7 Sr0.3 Mn O3 thin films have been prepared on amorphous Si O2 substrates by a rf magnetron sputtering technique under various oxygen flow rates and rf powers at a relatively low substrate temperature of 350 °C. The effects of oxygen flow rate and rf power on their physical properties were systematically investigated. X-ray diffraction results show that the growth orientation and crystallinity of the films were affected by rf power and oxygen flow rate. The electrical resistivity of the films was reduced with increasing oxygen flow rate and rf power due to enhanced {100} growth plane orientation and enlarged grain size of the films. In addition, a relatively high temperature coefficient of resistance value of -2.4% was obtained in the present investigation even with low deposition temperature.

Original languageEnglish
Pages (from-to)595-600
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number4
Publication statusPublished - 2009 Jul 17

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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