Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

Taewook Nam, Hyunho Lee, Taejin Choi, Seunggi Seo, Chang Mo Yoon, Yunjung Choi, Heonjong Jeong, Hima K. Lingam, Venkateswara R. Chitturi, Andrey Korolev, Jong Hyun Ahn, Hyungjun Kim

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy