Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads

Shan X. Wang, Jongill Hong

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

Original languageEnglish
Pages (from-to)782-787
Number of pages6
JournalIEEE Transactions on Magnetics
Volume35
Issue number2 PART 1
DOIs
Publication statusPublished - 1999 Dec 1

Fingerprint

Anisotropy
Magnetocrystalline anisotropy
X rays
Magnetostriction
Reactive sputtering
Stress measurement
Magnetic materials
SQUIDs
Substrates
Synchrotron radiation
Compressive stress
Poles
Magnetic properties
Transmission electron microscopy
Microstructure
Processing
Temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

@article{0d3aea96ae2a4f56a68c559fa615d337,
title = "Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads",
abstract = "Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.",
author = "Wang, {Shan X.} and Jongill Hong",
year = "1999",
month = "12",
day = "1",
doi = "10.1109/20.750645",
language = "English",
volume = "35",
pages = "782--787",
journal = "IEEE Transactions on Magnetics",
issn = "0018-9464",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "2 PART 1",

}

Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads. / Wang, Shan X.; Hong, Jongill.

In: IEEE Transactions on Magnetics, Vol. 35, No. 2 PART 1, 01.12.1999, p. 782-787.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads

AU - Wang, Shan X.

AU - Hong, Jongill

PY - 1999/12/1

Y1 - 1999/12/1

N2 - Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

AB - Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

UR - http://www.scopus.com/inward/record.url?scp=0001602534&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001602534&partnerID=8YFLogxK

U2 - 10.1109/20.750645

DO - 10.1109/20.750645

M3 - Article

VL - 35

SP - 782

EP - 787

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

SN - 0018-9464

IS - 2 PART 1

ER -