Magnetic hysteresis dynamics in Ni80Fe20 thin films

W. Y. Lee, J. A.C. Bland

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The dynamic magnetization reversal behavior of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90 ∼ 300 K by applying a magnetic field along the easy magnetization axis of the samples. The loop area A is found to follow the scaling relation A ∝ Hα0ΩβT with α ≈ 0.9, β ≈ 0.8, and γ = 0.38 for both thicknesses, where H0 is the magnetic field amplitude, Ω is frequency, and T is temperature. This behavior is only qualitatively consistent with theoretical models if the magnetization reversal mechanism is identical for both films, independently of the applied field and sample temperature. The exponents α and βare found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. The hard-axis loop also evolves with increasing frequency, and the loop areas of the hard axis obey the scaling relation with βHA = 0.47 ± 0.02.

Original languageEnglish
Pages (from-to)661-666
Number of pages6
JournalJournal of the Korean Physical Society
Volume39
Issue number4 SUPPL. Part 1
Publication statusPublished - 2001 Oct

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Fingerprint

Dive into the research topics of 'Magnetic hysteresis dynamics in Ni80Fe20 thin films'. Together they form a unique fingerprint.

Cite this