Magnetic hysteresis dynamics in Ni80Fe20 thin films

W. Y. Lee, J. A.C. Bland

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The dynamic magnetization reversal behavior of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90 ∼ 300 K by applying a magnetic field along the easy magnetization axis of the samples. The loop area A is found to follow the scaling relation A ∝ Hα0ΩβT with α ≈ 0.9, β ≈ 0.8, and γ = 0.38 for both thicknesses, where H0 is the magnetic field amplitude, Ω is frequency, and T is temperature. This behavior is only qualitatively consistent with theoretical models if the magnetization reversal mechanism is identical for both films, independently of the applied field and sample temperature. The exponents α and βare found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. The hard-axis loop also evolves with increasing frequency, and the loop areas of the hard axis obey the scaling relation with βHA = 0.47 ± 0.02.

Original languageEnglish
Pages (from-to)661-666
Number of pages6
JournalJournal of the Korean Physical Society
Volume39
Issue number4 SUPPL. Part 1
Publication statusPublished - 2001 Oct 1

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hysteresis
thin films
magnetization
temperature
scaling
magnetic fields
film thickness
exponents

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Lee, W. Y. ; Bland, J. A.C. / Magnetic hysteresis dynamics in Ni80Fe20 thin films. In: Journal of the Korean Physical Society. 2001 ; Vol. 39, No. 4 SUPPL. Part 1. pp. 661-666.
@article{4fd5603292a24c038f21d0ae48e7e295,
title = "Magnetic hysteresis dynamics in Ni80Fe20 thin films",
abstract = "The dynamic magnetization reversal behavior of polycrystalline Ni80Fe20 films (thickness 60 and 200 {\AA}) was studied in the temperature range 90 ∼ 300 K by applying a magnetic field along the easy magnetization axis of the samples. The loop area A is found to follow the scaling relation A ∝ Hα0ΩβT-γ with α ≈ 0.9, β ≈ 0.8, and γ = 0.38 for both thicknesses, where H0 is the magnetic field amplitude, Ω is frequency, and T is temperature. This behavior is only qualitatively consistent with theoretical models if the magnetization reversal mechanism is identical for both films, independently of the applied field and sample temperature. The exponents α and βare found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. The hard-axis loop also evolves with increasing frequency, and the loop areas of the hard axis obey the scaling relation with βHA = 0.47 ± 0.02.",
author = "Lee, {W. Y.} and Bland, {J. A.C.}",
year = "2001",
month = "10",
day = "1",
language = "English",
volume = "39",
pages = "661--666",
journal = "Journal of the Korean Physical Society",
issn = "0374-4884",
publisher = "Korean Physical Society",
number = "4 SUPPL. Part 1",

}

Lee, WY & Bland, JAC 2001, 'Magnetic hysteresis dynamics in Ni80Fe20 thin films', Journal of the Korean Physical Society, vol. 39, no. 4 SUPPL. Part 1, pp. 661-666.

Magnetic hysteresis dynamics in Ni80Fe20 thin films. / Lee, W. Y.; Bland, J. A.C.

In: Journal of the Korean Physical Society, Vol. 39, No. 4 SUPPL. Part 1, 01.10.2001, p. 661-666.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Magnetic hysteresis dynamics in Ni80Fe20 thin films

AU - Lee, W. Y.

AU - Bland, J. A.C.

PY - 2001/10/1

Y1 - 2001/10/1

N2 - The dynamic magnetization reversal behavior of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90 ∼ 300 K by applying a magnetic field along the easy magnetization axis of the samples. The loop area A is found to follow the scaling relation A ∝ Hα0ΩβT-γ with α ≈ 0.9, β ≈ 0.8, and γ = 0.38 for both thicknesses, where H0 is the magnetic field amplitude, Ω is frequency, and T is temperature. This behavior is only qualitatively consistent with theoretical models if the magnetization reversal mechanism is identical for both films, independently of the applied field and sample temperature. The exponents α and βare found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. The hard-axis loop also evolves with increasing frequency, and the loop areas of the hard axis obey the scaling relation with βHA = 0.47 ± 0.02.

AB - The dynamic magnetization reversal behavior of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90 ∼ 300 K by applying a magnetic field along the easy magnetization axis of the samples. The loop area A is found to follow the scaling relation A ∝ Hα0ΩβT-γ with α ≈ 0.9, β ≈ 0.8, and γ = 0.38 for both thicknesses, where H0 is the magnetic field amplitude, Ω is frequency, and T is temperature. This behavior is only qualitatively consistent with theoretical models if the magnetization reversal mechanism is identical for both films, independently of the applied field and sample temperature. The exponents α and βare found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. The hard-axis loop also evolves with increasing frequency, and the loop areas of the hard axis obey the scaling relation with βHA = 0.47 ± 0.02.

UR - http://www.scopus.com/inward/record.url?scp=0035541351&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035541351&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0035541351

VL - 39

SP - 661

EP - 666

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

SN - 0374-4884

IS - 4 SUPPL. Part 1

ER -