We have investigated high-saturation FeMoN and FeRhN films, deposited by radio frequency -diode reactive sputtering on alumina-TiC substrates, for inductive head applications. A minimum coercivity of approx. 1.2 Oe is obtained in (Fe 97.8Mo 2.2)N films at a N 2/Ar flow ratio of approx. 6.2%. A minimum coercivity of approx. 1.6 Oe is obtained in (Fe 96.9Rh 3.1)N films at a N 2/Ar flow ratio of approx. 4.6%. The films mainly consist of α-Fe phase and γ′-Fe 4N phase. The magnetic properties of these films are stable under easy-axis field annealing up to 350°C. Addition of Rh or Mo to FeN has resulted in a significant improvement in corrosion resistance over that of FeN. The localized corrosion resistance of FeRhN and FeMoN can be comparable to that of Permalloy. In contrast, their intrinsic corrosion resistance is inferior to that of Permalloy, but it can be adjusted and controlled by pH level.
Bibliographical noteFunding Information:
Manuscript received June 10, 1999; revised September 27, 1999. This work was supported in part by the National Science Foundation under Grant ECS-9710223. S. X. Wang is with the Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-4045 USA (e-mail: firstname.lastname@example.org). K. Sin is with the Read-Rite Corporation, Fremont, CA 94539 USA. J. Hong is with the File Memory Laboratory, Fujitsu Limited, Atsugi 243-0197 Japan. L. Nguyentran is with the IBM Storage Systems Division, San Jose, CA 92037 USA. Publisher Item Identifier S 0018-9464(00)00473-8.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering