Magnetisation reversal dynamics in Ni80Fe20 thin films

W. Y. Lee, K. H. Shin, B. C. Choi, J. A.C. Bland

Research output: Contribution to journalArticle

Abstract

The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A∝H0αΩ βT with α≈0.9, β≈0.8, and γ = 0.38 for both thicknesses. The exponents α and β are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range.

Original languageEnglish
Pages (from-to)103-105
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume239
Issue number1-3
DOIs
Publication statusPublished - 2002 Feb 1

Fingerprint

Magnetization reversal
Thin films
magnetization
thin films
Temperature
temperature
Film thickness
film thickness
exponents
scaling

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Lee, W. Y. ; Shin, K. H. ; Choi, B. C. ; Bland, J. A.C. / Magnetisation reversal dynamics in Ni80Fe20 thin films. In: Journal of Magnetism and Magnetic Materials. 2002 ; Vol. 239, No. 1-3. pp. 103-105.
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Magnetisation reversal dynamics in Ni80Fe20 thin films. / Lee, W. Y.; Shin, K. H.; Choi, B. C.; Bland, J. A.C.

In: Journal of Magnetism and Magnetic Materials, Vol. 239, No. 1-3, 01.02.2002, p. 103-105.

Research output: Contribution to journalArticle

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