Magnetisation reversal dynamics in Ni80Fe20 thin films

W. Y. Lee; K. H. Shin; B. C. Choi; J. A.C. Bland

doi:10.1016/S0304-8853(01)00586-8

Magnetisation reversal dynamics in Ni₈₀Fe₂₀ thin films

W. Y. Lee, K. H. Shin, B. C. Choi, J. A.C. Bland

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

The dynamic magnetisation reversal behaviour of polycrystalline Ni₈₀Fe₂₀ films (thickness 60 and 200 Å) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A∝H₀^αΩ ^βT^-γ with α≈0.9, β≈0.8, and γ = 0.38 for both thicknesses. The exponents α and β are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range.

Original language	English
Pages (from-to)	103-105
Number of pages	3
Journal	Journal of Magnetism and Magnetic Materials
Volume	239
Issue number	1-3
DOIs	https://doi.org/10.1016/S0304-8853(01)00586-8
Publication status	Published - 2002 Feb

Bibliographical note

Funding Information:
This work was supported by EPSRC (UK), the ESPRIT (EU), the KRCF (‘Quantum Dots-Functional Devices’) and MOST (“National Program for Tera-level Nanodevices”).

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Access to Document

10.1016/S0304-8853(01)00586-8

Cite this

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title = "Magnetisation reversal dynamics in Ni80Fe20 thin films",

abstract = "The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 {\AA}) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A∝H0αΩ βT-γ with α≈0.9, β≈0.8, and γ = 0.38 for both thicknesses. The exponents α and β are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range.",

author = "Lee, {W. Y.} and Shin, {K. H.} and Choi, {B. C.} and Bland, {J. A.C.}",

note = "Funding Information: This work was supported by EPSRC (UK), the ESPRIT (EU), the KRCF ({\textquoteleft}Quantum Dots-Functional Devices{\textquoteright}) and MOST (“National Program for Tera-level Nanodevices”).",

year = "2002",

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doi = "10.1016/S0304-8853(01)00586-8",

language = "English",

volume = "239",

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journal = "Journal of Magnetism and Magnetic Materials",

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T1 - Magnetisation reversal dynamics in Ni80Fe20 thin films

AU - Lee, W. Y.

AU - Shin, K. H.

AU - Choi, B. C.

AU - Bland, J. A.C.

N1 - Funding Information: This work was supported by EPSRC (UK), the ESPRIT (EU), the KRCF (‘Quantum Dots-Functional Devices’) and MOST (“National Program for Tera-level Nanodevices”).

PY - 2002/2

Y1 - 2002/2

N2 - The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A∝H0αΩ βT-γ with α≈0.9, β≈0.8, and γ = 0.38 for both thicknesses. The exponents α and β are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range.

AB - The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Å) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A∝H0αΩ βT-γ with α≈0.9, β≈0.8, and γ = 0.38 for both thicknesses. The exponents α and β are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range.

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