Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun, K. I. Lee, K. H. Lee, D. Y. Kim, J. Y. Chang, K. H. Shin, S. H. Han, J. G. Ha, Wooyoung Lee

Research output: Contribution to journalArticle

Abstract

The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

Original languageEnglish
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberSUPPL. 1
DOIs
Publication statusPublished - 2004 May 1

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Magnetoresistance
Thin films
thin films
Galvanomagnetic effects
room temperature
grain size
Temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Jeun, M. H. ; Lee, K. I. ; Lee, K. H. ; Kim, D. Y. ; Chang, J. Y. ; Shin, K. H. ; Han, S. H. ; Ha, J. G. ; Lee, Wooyoung. / Magnetoresistance behavior in electroplated and sputtered Bi thin films. In: Journal of Magnetism and Magnetic Materials. 2004 ; Vol. 272-276, No. SUPPL. 1.
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Jeun, MH, Lee, KI, Lee, KH, Kim, DY, Chang, JY, Shin, KH, Han, SH, Ha, JG & Lee, W 2004, 'Magnetoresistance behavior in electroplated and sputtered Bi thin films', Journal of Magnetism and Magnetic Materials, vol. 272-276, no. SUPPL. 1. https://doi.org/10.1016/j.jmmm.2003.12.733

Magnetoresistance behavior in electroplated and sputtered Bi thin films. / Jeun, M. H.; Lee, K. I.; Lee, K. H.; Kim, D. Y.; Chang, J. Y.; Shin, K. H.; Han, S. H.; Ha, J. G.; Lee, Wooyoung.

In: Journal of Magnetism and Magnetic Materials, Vol. 272-276, No. SUPPL. 1, 01.05.2004.

Research output: Contribution to journalArticle

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AU - Shin, K. H.

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