Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering

K. I. Lee, M. H. Jeun, K. H. Lee, J. Y. Chang, J. G. Ha, K. H. Shin, S. H. Han, W. Y. Lee

Research output: Contribution to journalConference article

Abstract

The magnetotransport of semimetallic Bi thin films, grown by electroplating and sputtering, was discussed. It was found that the magnetoresistance increased from 5,200% to 80,000% after annealing for the 20 μm Bi film. The thickness dependence of the MR for the polycrystalline and single crystalline films was found in the range one to 20 μm.

Original languageEnglish
Pages (from-to)ES06
JournalDigests of the Intermag Conference
Publication statusPublished - 2003 Oct 1
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: 2003 Mar 282003 Apr 3

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Lee, K. I., Jeun, M. H., Lee, K. H., Chang, J. Y., Ha, J. G., Shin, K. H., Han, S. H., & Lee, W. Y. (2003). Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering. Digests of the Intermag Conference, ES06.