Measurement method for profiling the residual stress of an optical fiber: Detailed analysis of off-focusing and beam-deflection effects

Yongwoo Park, Sangsoo Choi, Un Chul Paek, Kyunghwan Oh, Dug Young Kim

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The effects of off-focusing and beam deflection on polarimetric stress measurements of optical fibers are investigated. A simple method for reducing the distortion of the phase retardation caused by unwanted beam deflections in residual stress measurement is introduced. The method is examined numerically by ray-tracing techniques and experimentally by use of hollow silica fibers into which various indexmatching liquids have been inserted. An autofocusing technique is introduced. The error in stress measurement reproducibility was determined to be less than 4%. We tested the absolute error in measured stress by applying incremental external tension and determined that it is less than 0.464 MPa.

Original languageEnglish
Pages (from-to)1182-1190
Number of pages9
JournalApplied Optics
Volume42
Issue number7
DOIs
Publication statusPublished - 2003 Mar 1

Fingerprint

stress measurement
Stress measurement
residual stress
Optical fibers
deflection
Residual stresses
optical fibers
Ray tracing
ray tracing
hollow
Silica
silicon dioxide
fibers
Fibers
Liquids
liquids

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

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Measurement method for profiling the residual stress of an optical fiber : Detailed analysis of off-focusing and beam-deflection effects. / Park, Yongwoo; Choi, Sangsoo; Paek, Un Chul; Oh, Kyunghwan; Kim, Dug Young.

In: Applied Optics, Vol. 42, No. 7, 01.03.2003, p. 1182-1190.

Research output: Contribution to journalArticle

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