Measurement of OH radical in nonthermal plasma for NO/NO2 reduction

Chul Woung Park, Jae Won Hahn, Dong Nam Shin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

NO in exhaust gas is the major source of air pollutants, causing photochemical smog and acid rain. The corona discharge plasma process for removal of NO has been studied intensively for increasing its removal efficiency. Therefore, the development of diagnostic tools measuring major species and minor radicals produced in the plasma is important to characterize the removal process. OH is one of the oxidizing radicals that can initiate the NO removal process. The end product (HNO3) of the NO oxidation process is produced by the OH and NO2 reaction. Therefore the OH concentration is closely related to the removal efficiency of NO and NO2. In the study we measure the oxidizing radical OH emission spectrum in a nonthermal plasma reactor and investigated H2O, H2O2 and C2H4 additive effects on NO/NO2 reduction and OH emission intensity. For the measurement of the low intensity of OH emission in a corona discharge, we made a cylinder-wire type plasma reactor that concentrated the corona emission in the center of the reactor.

Original languageEnglish
Title of host publicationCLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages356-357
Number of pages2
ISBN (Electronic)0780356616, 9780780356610
DOIs
Publication statusPublished - 1999 Jan 1
Event1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 - Seoul, Korea, Republic of
Duration: 1999 Aug 301999 Sep 3

Publication series

NameCLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics
Volume2

Other

Other1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999
CountryKorea, Republic of
CitySeoul
Period99/8/3099/9/3

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Computer Networks and Communications
  • Physics and Astronomy(all)

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    Park, C. W., Hahn, J. W., & Shin, D. N. (1999). Measurement of OH radical in nonthermal plasma for NO/NO2 reduction. In CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics (pp. 356-357). [811466] (CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics; Vol. 2). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CLEOPR.1999.811466