MEASUREMENT OF RISE TIME DEPENDENT COUPLING SUPPRESSION IN LOSSY MICRO-TRANSMISSION LINES FOR WSI.

J. S. Kim, R. Selvaraj, J. F. McDonald

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The transmission characteristics of wafer-scale interconnection lines, which were modeled by weakly coupled lossy transmission lines, were investigated using the exact solutions of line equations in frequency domain and a modified inverse FFT algorithm. For the driven line terminated in Z//o, interconnection length in wafer-scale integration (WSI) should be less than 15-20 cm to obtain high performance with low coupling. In the case of homogeneous dielectric structure, rise time dependent coupling is suppressed for both the lossless and lossy lines. However, other loss-induced coupling effects, which are not rise time dependent, still cause some far-end noise on lossy lines. Analytical results agreed with measurements.

Original languageEnglish
Title of host publicationUnknown Host Publication Title
PublisherIEEE
Pages273-281
Number of pages9
ISBN (Print)0818607734
Publication statusPublished - 1987 Jan 1

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Kim, J. S., Selvaraj, R., & McDonald, J. F. (1987). MEASUREMENT OF RISE TIME DEPENDENT COUPLING SUPPRESSION IN LOSSY MICRO-TRANSMISSION LINES FOR WSI. In Unknown Host Publication Title (pp. 273-281). IEEE.