Mechanisms limiting EOT scaling and gate leakage currents of high-k/ Metal gate stacks directly on SiGe

Jeff Huang, Paul D. Kirsch, Jungwoo Oh, Se Hoon Lee, Prashant Majhi, H. Rusty Harris, Daivd C. Gilmer, Gennadi Bersuker, Dawei Heh, Chang Seo Park, Chanro Park, Hsing Huang Tseng, Raj Jammy

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15 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science