Metallic Ni 3 S 2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting

Thi Anh Ho, Changdeuck Bae, Hochul Nam, Eunsoo Kim, Seung Yong Lee, Jong Hyeok Park, Hyunjung Shin

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

We describe the direct preparation of crystalline Ni 3 S 2 thin films via atomic layer deposition (ALD) techniques at temperatures as low as 250 °C without postthermal treatments. A new ALD chemistry is proposed using bis(1-dimethylamino-2-methyl-2-butoxy) nickel(II) [Ni(dmamb) 2 ] and H 2 S as precursors. Homogeneous and conformal depositions of Ni 3 S 2 films were achieved on 4 in. wafers (both metal and oxide substrates, including Au and SiO 2 ). The resulting crystalline Ni 3 S 2 layers exhibited highly efficient and stable performance as electrocatalysts for both the hydrogen evolution reaction (HER) and the oxygen evolution reaction (OER) in alkaline solutions, with a low overpotential of 300 mV and a high turnover frequency for HER and an overpotential of 400 mV for OER (at a current density of 10 mA/cm 2 ). Using our Ni 3 S 2 films as both the cathode and the anode, two-electrode full-cell electrolyzers were constructed, which showed stable operation for 100 h at a current density of 10 mA/cm 2 . The proposed ALD electrocatalysts on planar surfaces exhibited the best performance among Ni 3 S 2 materials for overall water splitting recorded to date.

Original languageEnglish
Pages (from-to)12807-12815
Number of pages9
JournalACS Applied Materials and Interfaces
Volume10
Issue number15
DOIs
Publication statusPublished - 2018 Apr 18

Fingerprint

Atomic layer deposition
Electrocatalysts
Water
Hydrogen
Current density
Oxygen
Crystalline materials
Nickel
Oxides
Anodes
Cathodes
Metals
Thin films
Electrodes
Substrates
Temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Ho, Thi Anh ; Bae, Changdeuck ; Nam, Hochul ; Kim, Eunsoo ; Lee, Seung Yong ; Park, Jong Hyeok ; Shin, Hyunjung. / Metallic Ni 3 S 2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting In: ACS Applied Materials and Interfaces. 2018 ; Vol. 10, No. 15. pp. 12807-12815.
@article{4e9f3153aa0742aa83882615b1da5e93,
title = "Metallic Ni 3 S 2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting",
abstract = "We describe the direct preparation of crystalline Ni 3 S 2 thin films via atomic layer deposition (ALD) techniques at temperatures as low as 250 °C without postthermal treatments. A new ALD chemistry is proposed using bis(1-dimethylamino-2-methyl-2-butoxy) nickel(II) [Ni(dmamb) 2 ] and H 2 S as precursors. Homogeneous and conformal depositions of Ni 3 S 2 films were achieved on 4 in. wafers (both metal and oxide substrates, including Au and SiO 2 ). The resulting crystalline Ni 3 S 2 layers exhibited highly efficient and stable performance as electrocatalysts for both the hydrogen evolution reaction (HER) and the oxygen evolution reaction (OER) in alkaline solutions, with a low overpotential of 300 mV and a high turnover frequency for HER and an overpotential of 400 mV for OER (at a current density of 10 mA/cm 2 ). Using our Ni 3 S 2 films as both the cathode and the anode, two-electrode full-cell electrolyzers were constructed, which showed stable operation for 100 h at a current density of 10 mA/cm 2 . The proposed ALD electrocatalysts on planar surfaces exhibited the best performance among Ni 3 S 2 materials for overall water splitting recorded to date.",
author = "Ho, {Thi Anh} and Changdeuck Bae and Hochul Nam and Eunsoo Kim and Lee, {Seung Yong} and Park, {Jong Hyeok} and Hyunjung Shin",
year = "2018",
month = "4",
day = "18",
doi = "10.1021/acsami.8b00813",
language = "English",
volume = "10",
pages = "12807--12815",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "15",

}

Metallic Ni 3 S 2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting . / Ho, Thi Anh; Bae, Changdeuck; Nam, Hochul; Kim, Eunsoo; Lee, Seung Yong; Park, Jong Hyeok; Shin, Hyunjung.

In: ACS Applied Materials and Interfaces, Vol. 10, No. 15, 18.04.2018, p. 12807-12815.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Metallic Ni 3 S 2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting

AU - Ho, Thi Anh

AU - Bae, Changdeuck

AU - Nam, Hochul

AU - Kim, Eunsoo

AU - Lee, Seung Yong

AU - Park, Jong Hyeok

AU - Shin, Hyunjung

PY - 2018/4/18

Y1 - 2018/4/18

N2 - We describe the direct preparation of crystalline Ni 3 S 2 thin films via atomic layer deposition (ALD) techniques at temperatures as low as 250 °C without postthermal treatments. A new ALD chemistry is proposed using bis(1-dimethylamino-2-methyl-2-butoxy) nickel(II) [Ni(dmamb) 2 ] and H 2 S as precursors. Homogeneous and conformal depositions of Ni 3 S 2 films were achieved on 4 in. wafers (both metal and oxide substrates, including Au and SiO 2 ). The resulting crystalline Ni 3 S 2 layers exhibited highly efficient and stable performance as electrocatalysts for both the hydrogen evolution reaction (HER) and the oxygen evolution reaction (OER) in alkaline solutions, with a low overpotential of 300 mV and a high turnover frequency for HER and an overpotential of 400 mV for OER (at a current density of 10 mA/cm 2 ). Using our Ni 3 S 2 films as both the cathode and the anode, two-electrode full-cell electrolyzers were constructed, which showed stable operation for 100 h at a current density of 10 mA/cm 2 . The proposed ALD electrocatalysts on planar surfaces exhibited the best performance among Ni 3 S 2 materials for overall water splitting recorded to date.

AB - We describe the direct preparation of crystalline Ni 3 S 2 thin films via atomic layer deposition (ALD) techniques at temperatures as low as 250 °C without postthermal treatments. A new ALD chemistry is proposed using bis(1-dimethylamino-2-methyl-2-butoxy) nickel(II) [Ni(dmamb) 2 ] and H 2 S as precursors. Homogeneous and conformal depositions of Ni 3 S 2 films were achieved on 4 in. wafers (both metal and oxide substrates, including Au and SiO 2 ). The resulting crystalline Ni 3 S 2 layers exhibited highly efficient and stable performance as electrocatalysts for both the hydrogen evolution reaction (HER) and the oxygen evolution reaction (OER) in alkaline solutions, with a low overpotential of 300 mV and a high turnover frequency for HER and an overpotential of 400 mV for OER (at a current density of 10 mA/cm 2 ). Using our Ni 3 S 2 films as both the cathode and the anode, two-electrode full-cell electrolyzers were constructed, which showed stable operation for 100 h at a current density of 10 mA/cm 2 . The proposed ALD electrocatalysts on planar surfaces exhibited the best performance among Ni 3 S 2 materials for overall water splitting recorded to date.

UR - http://www.scopus.com/inward/record.url?scp=85045654980&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85045654980&partnerID=8YFLogxK

U2 - 10.1021/acsami.8b00813

DO - 10.1021/acsami.8b00813

M3 - Article

AN - SCOPUS:85045654980

VL - 10

SP - 12807

EP - 12815

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 15

ER -