Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area

Beom Seok Kim, Sangwoo Shin, Seung Jae Shin, Kyung Min Kim, Hyung Hee Cho

Research output: Contribution to journalArticlepeer-review

41 Citations (Scopus)

Abstract

Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughness, and wettability are developed for the boiling applications. MNHS structures consist of micropillars or microcavities along with nanowires having the length to diameter ratio of about 100:1. MNHS is fabricated by a two-step silicon etching process, which are dry etching for micropattern and electroless silicon wet etching for nanowire synthesis. The fabrication process is readily capable of producing MNHS covering a wafer-scale area. By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability. MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.

Original languageEnglish
Article number333
JournalNanoscale Research Letters
Volume6
Issue number1
DOIs
Publication statusPublished - 2011 Jan

Bibliographical note

Funding Information:
This study was supported by Mid-career Researcher Program through NRF Grant funded by the MEST (No. 2011-0000252). The author, B. S. Kim is grateful for the Seoul Science Fellowship by Seoul Metropolitan Government.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

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