Micro-scale patterning of indium tin oxide film by spatially modulated pulsed Nd: YAG laser beam

Jinsoo Lee, Seongsu Kim, Myeongkyu Lee

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.

Original languageEnglish
Pages (from-to)9107-9111
Number of pages5
JournalApplied Surface Science
Volume258
Issue number23
DOIs
Publication statusPublished - 2012 Sep 15

Fingerprint

Tin oxides
Indium
Oxide films
Laser beams
Photoresists
Pulsed lasers
Etching
Laser pulses
Throughput
Glass
Wavelength
Substrates
indium tin oxide

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

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abstract = "Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.",
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Micro-scale patterning of indium tin oxide film by spatially modulated pulsed Nd : YAG laser beam. / Lee, Jinsoo; Kim, Seongsu; Lee, Myeongkyu.

In: Applied Surface Science, Vol. 258, No. 23, 15.09.2012, p. 9107-9111.

Research output: Contribution to journalArticle

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