Abstract
Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.
| Original language | English |
|---|---|
| Pages (from-to) | 9107-9111 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 258 |
| Issue number | 23 |
| DOIs | |
| Publication status | Published - 2012 Sep 15 |
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All Science Journal Classification (ASJC) codes
- Surfaces, Coatings and Films
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Micro-scale patterning of indium tin oxide film by spatially modulated pulsed Nd : YAG laser beam. / Lee, Jinsoo; Kim, Seongsu; Lee, Myeongkyu.
In: Applied Surface Science, Vol. 258, No. 23, 15.09.2012, p. 9107-9111.Research output: Contribution to journal › Article
TY - JOUR
T1 - Micro-scale patterning of indium tin oxide film by spatially modulated pulsed Nd
T2 - YAG laser beam
AU - Lee, Jinsoo
AU - Kim, Seongsu
AU - Lee, Myeongkyu
PY - 2012/9/15
Y1 - 2012/9/15
N2 - Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.
AB - Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.
UR - http://www.scopus.com/inward/record.url?scp=84864470433&partnerID=8YFLogxK
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U2 - 10.1016/j.apsusc.2011.07.111
DO - 10.1016/j.apsusc.2011.07.111
M3 - Article
AN - SCOPUS:84864470433
VL - 258
SP - 9107
EP - 9111
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
IS - 23
ER -