Microfabrication method using a combination of local ion implantation and magnetorheological finishing

Jin Han, Jong Wook Kim, Hiwon Lee, Byung Kwon Min, Sang Jo Lee

Research output: Contribution to journalArticle

Abstract

A new microfabrication method that combines localized ion implantation and magnetorheological finishing is proposed. The proposed technique involves two steps. First, selected regions of a silicon wafer are irradiated with gallium ions by using a focused ion beam system. The mechanical properties of the irradiated regions are altered as a result of the ion implantation. Second, the wafer is processed by using a magnetorheological finishing method. During the finishing process, the regions not implanted with ion are preferentially removed. The material removal rate difference is utilized for microfabrication. The mechanisms of the proposed method are discussed, and applications are presented.

Original languageEnglish
Article number026503
JournalApplied Physics Express
Volume2
Issue number2
DOIs
Publication statusPublished - 2009 Feb 1

Fingerprint

Microfabrication
Ion implantation
ion implantation
wafers
machining
gallium
ions
Focused ion beams
ion beams
Ions
mechanical properties
Gallium
Silicon wafers
silicon
Mechanical properties

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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Microfabrication method using a combination of local ion implantation and magnetorheological finishing. / Han, Jin; Kim, Jong Wook; Lee, Hiwon; Min, Byung Kwon; Lee, Sang Jo.

In: Applied Physics Express, Vol. 2, No. 2, 026503, 01.02.2009.

Research output: Contribution to journalArticle

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