Microfabrication method using a combination of local ion implantation and magnetorheological finishing

Jin Han; Jong Wook Kim; Hiwon Lee; Byung Kwon Min; Sang Jo Lee

doi:10.1143/APEX.2.026503

Microfabrication method using a combination of local ion implantation and magnetorheological finishing

Jin Han, Jong Wook Kim, Hiwon Lee, Byung Kwon Min, Sang Jo Lee

Department of Mechanical Engineering

Research output: Contribution to journal › Article

1 Citation (Scopus)

Abstract

A new microfabrication method that combines localized ion implantation and magnetorheological finishing is proposed. The proposed technique involves two steps. First, selected regions of a silicon wafer are irradiated with gallium ions by using a focused ion beam system. The mechanical properties of the irradiated regions are altered as a result of the ion implantation. Second, the wafer is processed by using a magnetorheological finishing method. During the finishing process, the regions not implanted with ion are preferentially removed. The material removal rate difference is utilized for microfabrication. The mechanisms of the proposed method are discussed, and applications are presented.

Original language	English
Article number	026503
Journal	Applied Physics Express
Volume	2
Issue number	2
DOIs	https://doi.org/10.1143/APEX.2.026503
Publication status	Published - 2009 Feb 1

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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Han, J., Kim, J. W., Lee, H., Min, B. K., & Lee, S. J. (2009). Microfabrication method using a combination of local ion implantation and magnetorheological finishing. Applied Physics Express, 2(2), [026503]. https://doi.org/10.1143/APEX.2.026503

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