Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

Kwang Seok Yun, Euisik Yoon

Research output: Contribution to journalConference article

6 Citations (Scopus)


This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.

Original languageEnglish
Pages (from-to)757-760
Number of pages4
JournalProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication statusPublished - 2004 Jul 19
Event17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
Duration: 2004 Jan 252004 Jan 29


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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