Microscale Soft Patterning for Solution Processable Metal Oxide Thin Film Transistors

Sang Wook Jung, Soo Sang Chae, Jee Ho Park, Jin Young Oh, Suk Ho Bhang, Hong Koo Baik, Tae Il Lee

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


We introduce a microscale soft pattering (MSP) route utilizing contact printing of chemically inert sub-nanometer thick low molecular weight (LMW) poly(dimethylsiloxane) (PDMS) layers. These PDMS layers serve as a release agent layer between the n-type Ohmic metal and metal oxide semiconductors (MOSs) and provide a layer that protects the MOS from water in the surrounding environment. The feasibility of our MSP route was experimentally demonstrated by fabricating solution processable In2O3, IZO, and IGZO TFTs with aluminum (Al), a typical n-type Ohmic metal. We have demonstrated patterning gaps as small as 13 μm. The TFTs fabricated using MSP showed higher field-effect-mobility and lower hysteresis in comparison with those made using conventional photolithography.

Original languageEnglish
Pages (from-to)7205-7211
Number of pages7
JournalACS Applied Materials and Interfaces
Issue number11
Publication statusPublished - 2016 Mar 30

Bibliographical note

Funding Information:
This work was supported by the Gachon University research fund of 2014(GCU-2014-0216). Further funding was provided by LG Display.

Publisher Copyright:
© 2016 American Chemical Society.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)


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