Microstructure analyses of the titanium films formed by the ionized sputtering process

Dae Hong Ko, Eun Ha Kim, Siyoung Choi, Bong Young Yoo, Hyeon Deok Lee

Research output: Contribution to journalArticle

10 Citations (Scopus)


We investigated the microstructure of the Ti-films formed on the (001) single crystal silicon wafers through the ionized sputtering process, and compared the results with those obtained by collimated sputtering. We found that the Ti-films created by ionized sputtering process without the substrate bias show less strong (002) textures than collimated sputtering. The Ti-films created by the ionized sputtering process with the substrate bias did not show any observable strong textures. We also found that the ionized sputtering processed Ti-films show about 4 nm thick amorphous Ti-Si interlayer, which is much thicker than that of the collimated sputtering process. The modifications of the microstructure of Ti-films are attributed to the ion bombardments during the ionized sputtering deposition process.

Original languageEnglish
Pages (from-to)13-17
Number of pages5
JournalThin Solid Films
Issue number1
Publication statusPublished - 1999 Feb 26

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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