Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system

In Joong Kim; Yong Hyeon Shin; Ilgu Yun

doi:10.1109/ICEP-IAAC.2015.7111092

Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system

In Joong Kim, Yong Hyeon Shin, Ilgu Yun

Department of Electrical and Electronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

Based on a measurable range of optical emission spectroscopy (OES), the modeling of plasma characteristic is investigated depending on the position of incident angle of OES. In this work, OES is installed in the viewpoint of the plasma assisted atomic layer deposition (PA-ALD) system and plasma characteristic is measured using OES. For the enhancement to obtain the plasma characteristic information, the measurement scheme by inserting body tube in front of optical fiber is developed to receive the limited light of plasma. Since a normal optical fiber is not possible to measure plasma uniformity, the proposed scheme can measure a gap of plasma intensity for each region of a wafer. The detailed analytic model is developed by using the analysis between the plasma intensity and the characteristic of PA-ALD. This scheme can allow us to improve the accuracy of a plasma diagnosis, the detection capability of plasma abnormality and the manufacturability.

Original language	English
Title of host publication	ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	638-641
Number of pages	4
ISBN (Electronic)	9784904090138
DOIs	https://doi.org/10.1109/ICEP-IAAC.2015.7111092
Publication status	Published - 2015 May 20
Event	2015 International Conference on Electronic Packaging and iMAPS All Asia Conference, ICEP-IAAC 2015 - Kyoto, Japan Duration: 2015 Apr 14 → 2015 Apr 17

Publication series

Name	ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference

Other

Other	2015 International Conference on Electronic Packaging and iMAPS All Asia Conference, ICEP-IAAC 2015
Country/Territory	Japan
City	Kyoto
Period	15/4/14 → 15/4/17

Bibliographical note

Publisher Copyright:
© 2015 The Japan Institute of Electronics Packaging.

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

Access to Document

10.1109/ICEP-IAAC.2015.7111092

Cite this

Kim, I. J., Shin, Y. H., & Yun, I. (2015). Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system. In ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference (pp. 638-641). [7111092] (ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICEP-IAAC.2015.7111092

Kim, In Joong ; Shin, Yong Hyeon ; Yun, Ilgu. / Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system. ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference. Institute of Electrical and Electronics Engineers Inc., 2015. pp. 638-641 (ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference).

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title = "Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system",

abstract = "Based on a measurable range of optical emission spectroscopy (OES), the modeling of plasma characteristic is investigated depending on the position of incident angle of OES. In this work, OES is installed in the viewpoint of the plasma assisted atomic layer deposition (PA-ALD) system and plasma characteristic is measured using OES. For the enhancement to obtain the plasma characteristic information, the measurement scheme by inserting body tube in front of optical fiber is developed to receive the limited light of plasma. Since a normal optical fiber is not possible to measure plasma uniformity, the proposed scheme can measure a gap of plasma intensity for each region of a wafer. The detailed analytic model is developed by using the analysis between the plasma intensity and the characteristic of PA-ALD. This scheme can allow us to improve the accuracy of a plasma diagnosis, the detection capability of plasma abnormality and the manufacturability.",

author = "Kim, {In Joong} and Shin, {Yong Hyeon} and Ilgu Yun",

note = "Publisher Copyright: {\textcopyright} 2015 The Japan Institute of Electronics Packaging.; 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference, ICEP-IAAC 2015 ; Conference date: 14-04-2015 Through 17-04-2015",

year = "2015",

month = may,

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doi = "10.1109/ICEP-IAAC.2015.7111092",

language = "English",

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Kim, IJ, Shin, YH & Yun, I 2015, Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system. in ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference., 7111092, ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference, Institute of Electrical and Electronics Engineers Inc., pp. 638-641, 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference, ICEP-IAAC 2015, Kyoto, Japan, 15/4/14. https://doi.org/10.1109/ICEP-IAAC.2015.7111092

Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system. / Kim, In Joong; Shin, Yong Hyeon; Yun, Ilgu.

ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference. Institute of Electrical and Electronics Engineers Inc., 2015. p. 638-641 7111092 (ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Kim, In Joong

AU - Shin, Yong Hyeon

AU - Yun, Ilgu

PY - 2015/5/20

Y1 - 2015/5/20

N2 - Based on a measurable range of optical emission spectroscopy (OES), the modeling of plasma characteristic is investigated depending on the position of incident angle of OES. In this work, OES is installed in the viewpoint of the plasma assisted atomic layer deposition (PA-ALD) system and plasma characteristic is measured using OES. For the enhancement to obtain the plasma characteristic information, the measurement scheme by inserting body tube in front of optical fiber is developed to receive the limited light of plasma. Since a normal optical fiber is not possible to measure plasma uniformity, the proposed scheme can measure a gap of plasma intensity for each region of a wafer. The detailed analytic model is developed by using the analysis between the plasma intensity and the characteristic of PA-ALD. This scheme can allow us to improve the accuracy of a plasma diagnosis, the detection capability of plasma abnormality and the manufacturability.

AB - Based on a measurable range of optical emission spectroscopy (OES), the modeling of plasma characteristic is investigated depending on the position of incident angle of OES. In this work, OES is installed in the viewpoint of the plasma assisted atomic layer deposition (PA-ALD) system and plasma characteristic is measured using OES. For the enhancement to obtain the plasma characteristic information, the measurement scheme by inserting body tube in front of optical fiber is developed to receive the limited light of plasma. Since a normal optical fiber is not possible to measure plasma uniformity, the proposed scheme can measure a gap of plasma intensity for each region of a wafer. The detailed analytic model is developed by using the analysis between the plasma intensity and the characteristic of PA-ALD. This scheme can allow us to improve the accuracy of a plasma diagnosis, the detection capability of plasma abnormality and the manufacturability.

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M3 - Conference contribution

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T3 - ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference

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BT - ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference

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ER -

Kim IJ, Shin YH, Yun I. Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system. In ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference. Institute of Electrical and Electronics Engineers Inc. 2015. p. 638-641. 7111092. (ICEP-IAAC 2015 - 2015 International Conference on Electronic Packaging and iMAPS All Asia Conference). doi: 10.1109/ICEP-IAAC.2015.7111092

Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system

Abstract

Publication series

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Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

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Cite this