Modeling of three-dimensional photoresist profiles exposed by localized fields of high-transmission nano-apertures

Eungman Lee, Jae Won Hahn

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Using a simple theoretical model, we calculate three-dimensional profiles of photoresist exposed by arbitrarily shaped localized fields of high-transmission metal nano-apertures. We apply the finite difference time domain (FDTD) method to obtain the localized field distributions, which are generated by excitation of localized surface plasmon polaritons underneath a C-shaped or a bow-tie-shaped aperture. Incorporating the results of FDTD simulations with the theoretical model, we visualize three-dimensional exposure profiles of the photoresist as a function of the exposure dose and the gap distance between the aperture and the photoresist. It is found that the three-dimensional exposure profiles provide useful information for choosing process parameters for nanopatterning by plasmonic lithography using the aperture.

Original languageEnglish
Article number275303
JournalNanotechnology
Volume19
Issue number27
DOIs
Publication statusPublished - 2008 Jul 9

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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