TY - JOUR
T1 - Molecular recognition in self-assembled integrated circuits
T2 - getting smaller while under control
AU - Lim, Yong Beom
AU - Lee, Myongsoo
PY - 2009/4/27
Y1 - 2009/4/27
N2 - Available in small print: Block copolymer lithography has great potential for reducing the size and fabrication time of integrated circuits. Hydrogen-bonding-mediated molecular recognition in self-assembly processes can be used to produce highly ordered square arrays of block copolymers on the surface of a silicon substrate (see picture).
AB - Available in small print: Block copolymer lithography has great potential for reducing the size and fabrication time of integrated circuits. Hydrogen-bonding-mediated molecular recognition in self-assembly processes can be used to produce highly ordered square arrays of block copolymers on the surface of a silicon substrate (see picture).
UR - http://www.scopus.com/inward/record.url?scp=70349915688&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=70349915688&partnerID=8YFLogxK
U2 - 10.1002/anie.200805687
DO - 10.1002/anie.200805687
M3 - Article
C2 - 19283802
AN - SCOPUS:70349915688
SN - 1433-7851
VL - 48
SP - 3394
EP - 3396
JO - Angewandte Chemie - International Edition
JF - Angewandte Chemie - International Edition
IS - 19
ER -