Molecular recognition in self-assembled integrated circuits: getting smaller while under control

Yong Beom Lim, Myongsoo Lee

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Available in small print: Block copolymer lithography has great potential for reducing the size and fabrication time of integrated circuits. Hydrogen-bonding-mediated molecular recognition in self-assembly processes can be used to produce highly ordered square arrays of block copolymers on the surface of a silicon substrate (see picture).

Original languageEnglish
Pages (from-to)3394-3396
Number of pages3
JournalAngewandte Chemie - International Edition
Volume48
Issue number19
DOIs
Publication statusPublished - 2009 Apr 27

Fingerprint

Molecular recognition
Block copolymers
Integrated circuits
Silicon
Self assembly
Lithography
Hydrogen bonds
Fabrication
Substrates

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)

Cite this

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Molecular recognition in self-assembled integrated circuits : getting smaller while under control. / Lim, Yong Beom; Lee, Myongsoo.

In: Angewandte Chemie - International Edition, Vol. 48, No. 19, 27.04.2009, p. 3394-3396.

Research output: Contribution to journalArticle

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